Laser Gas est maxime usus est laser annealing et lithoraphy Gas in electronics industria. Beneficium ex innovation of mobile phone screens et expansion applicationem locis, in scale humilis-temperatus Polysilicon Market erit amplius expanded, et laser annus processum est significantly amplio in perficientur de TFTs. Inter Neo, Fluorine et Argon Gases in ARF Excimer laser enim vestibulum semiconductors, neon rationes plus quam XCVI% of laser Gas mixtisque. Cum enim eleganti technology eleganti, in usum excimer lasers auctus est, et in introductio duplici nuditate technology habet duci ad acri incremento in demanda pro Neon Gas ab ARF lasers. Beneficia ex promotionem de localization electronic specialty vapores, domesticis manufacturers erit melior foro incrementum spatium in futurum.
Lithologs machina est core apparatu de semiconductor vestibulum. Lithologs definit magnitudinem transistores. Et coordinated progressionem de Lithologs Industry torquem est clavis ad breakthrough of Lithologs apparatus. Et matching semiconductor materiae ut photoresist, photolithography Gas, photomy, et coating et developing apparatu habere altum technological contentus. Lithologs Gas est Gas, quod Lithography apparatus generat altum ultraviolet laser. Diversis lithography vapores potest producere lumen fontes diversis fluclengs, et fluctibus directe afficit resolutio Lithologs machina, quae est de latitiis litholam machina. In MMXX, in summa global venditionesque Lithologs machinis erit CDXIII unitates, de qua Asml Sales CCLVIII unitates pro LXII%, Canon Sales CXXII Unitates pro XXX%, et Nikon XXXIII unitates reputatus VIII%.
Post tempus: Oct-15-2021
