QuidCarbon Tetrafluoride? Quid est usus?
Carbon Tetrafluoride, Etiam ut tetrafluorthehane, quod est in anorganicis compositis. Est usus in Plasma Etching processum de variis integrated circuits, et quoque usus est ut laser Gas et refrigerandum. Est relative firmum sub normalis temperatus et pressura, sed necesse est vitare contactus cum fortis oxidants, flammabiles et combustible materiae. Carbon Tetrafluoride est a non-combustibilis Gas. Si certaminibus altum calorem, quod erit causa internum pressura est continens ad augendam, et est periculum artificio et CREPITUS. Plerumque non solum penitus liquor Ammonia-sodium metallum Reagent ad locus temperatus.
Carbon TetrafluorideEst currently ad maximam Plasma Etching Gas in Microelectronics industria. It can be widely used in the etching of silicon, silicon dioxide, phosphosilicate glass and other thin film materials, cleaning the surface of electronic devices, solar cell production, laser technology, Gas-phase insulation, low-temperature refrigeration, leak detection agents, and detergents in printed circuit production have a large number of applications.
Post tempus: Nov-01-2021
